Key Features
- Stable Half-Tone (4-mask) Patterning Properties
- LTPS Process Compatibility with No Particle Defect
- High Resolution and Adhesion
- Various Wavelengths Applied PR (G-line, I-line)
- Very Low Turbity
Product
Posi PR
Photoresist (PR) is a chemical substance whose properties change in response to (sensitization) to light. In displays, it is a key material used in the photolithography process to form fine circuits in TFT (Thin Film Transistors).
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Figure. Root cause of particle generation
PAC shows vary stable state when exist hydrogen bonding of Novolak & PAC 
But, normal LCD PAC have strong steric hindrance, so easily broking hydrogen bonding of Novolak & PAC, and making particle -
Table. Resolution of
EMTIER LCD & Oxide photoresist
Table. 4um Hole thermal stability of
EMTIER LCD & Oxide photoresist
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Table. Resolution of EMTIER LTPS PR
Relevant Product Line
- LTP5
- 4Mask, 5Mask
- High Resolution
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