Key Features
- Stable Half-Tone (4-mask) Patterning Properties
- LTPS Process Compatibility with No Particle Defect
- High Resolution and Adhesion
- Various Wavelengths Applied PR (G-line, I-line)
- Very Low Turbity
제품정보
Posi PR
포토레지스트(Photoresist, PR)는 빛에 반응(감광)하여 특성이 변하는 화학물질로, 디스플레이에서는 TFT(박막트랜지스터)에
미세한 회로를 형성하는 포토리소그래피(Photolithography)공정에 사용되는 핵심 재료입니다.
-
Figure. Root cause of particle generation
PAC shows vary stable state when exist hydrogen bonding of Novolak & PAC 
But, normal LCD PAC have strong steric hindrance, so easily broking hydrogen bonding of Novolak & PAC, and making particle -
Table. Resolution of
EMTIER LCD & Oxide photoresist
Table. 4um Hole thermal stability of
EMTIER LCD & Oxide photoresist
-
Table. Resolution of EMTIER LTPS PR
관련제품군
- LTP5
- 4Mask, 5Mask
- High Resolution