光刻胶 - 엠티어

产品信息

光刻胶 (Photoresist, PR) 是一种通过对光产生反应（感光）来改变特性的化学物质，在显示器上，它是光刻(Photolithography)工
艺技术中用于在TFT（薄膜晶体管）中形成细微电路的核心材料。

Key Features
- Stable Half-Tone (4-mask) Patterning Properties
- LTPS Process Compatibility with No Particle Defect
- High Resolution and Adhesion
- Various Wavelengths Applied PR (G-line, I-line)
- Very Low Turbity
Figure. Root cause of particle generation

PAC shows vary stable state when exist hydrogen bonding of Novolak & PAC

But, normal LCD PAC have strong steric hindrance, so easily broking hydrogen bonding of Novolak & PAC, and making particle
Table. Resolution of
易美太 LCD & Oxide photoresist

Table. 4um Hole thermal stability of
易美太 LCD & Oxide photoresist
Table. Resolution of 易美太 LTPS PR
相关产品群
- LTP5
- 4Mask, 5Mask
- High Resolution